The data indicate that the strength of the bond can be optimized by well-planned, meticulous integration, when the substrate is properly prepared. When it comes to the special characteristics of glass substrates, we believe that an overview and an interest in Si CVD substrates called c-Si (sintered) with the realization that significant research in this field has been underway for many years will be the most essential starting point. The Si CVD (chemical vapor phase deposition) technology is one of the key technologies for the mass production of TFT-LCD (liquid crystal display) panels. CVD is an abbreviation for chemical vapor deposition. In the field of semiconductor, it is often used to refer to the deposition process for semiconductors such as silicon and germanium. In this article, I will explain the basic production process and the key problems of the process. Specifically, we will focus on the chemical vapor deposition (CVD) of α-Si (silicon) thin films by LPCVD for display substrates.
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